发明授权
- 专利标题: Detection of weak points of a mask
- 专利标题(中): 检测面膜的弱点
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申请号: US13795584申请日: 2013-03-12
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公开(公告)号: US09299135B2公开(公告)日: 2016-03-29
- 发明人: Aviram Tam , Michael Ben-Yishai , Yaron Cohen
- 申请人: APPLIED MATERIALS ISRAEL, LTD.
- 申请人地址: IL Rehovot
- 专利权人: Applied Materials Israel, Ltd.
- 当前专利权人: Applied Materials Israel, Ltd.
- 当前专利权人地址: IL Rehovot
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G06T7/00 ; G03F1/84
摘要:
An inspection system, and a computer program product that stores instructions for: obtaining an aerial image of an area of the mask; wherein the aerial image represents an expected image to be formed on a photoresist of an object during a lithography process that involves illuminating the area of the mask, by a lithography tool; wherein the photoresist has a printability threshold; wherein the lithography process exhibits a process window that introduces allowable changes at pixels of the expected image that do not exceed an intensity threshold; and searching for at least one weak point at the area of the mask, which is either a local extremum point of the aerial image spaced apart from the printability threshold by a distance that does not exceed the intensity threshold or a crossing point of the printability threshold and being of a slope that is below a predefined threshold.
公开/授权文献
- US20140270468A1 DETECTION OF WEAK POINTS OF A MASK 公开/授权日:2014-09-18
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