Invention Grant
- Patent Title: Detection of weak points of a mask
- Patent Title (中): 检测面膜的弱点
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Application No.: US13795584Application Date: 2013-03-12
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Publication No.: US09299135B2Publication Date: 2016-03-29
- Inventor: Aviram Tam , Michael Ben-Yishai , Yaron Cohen
- Applicant: APPLIED MATERIALS ISRAEL, LTD.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G03F1/84

Abstract:
An inspection system, and a computer program product that stores instructions for: obtaining an aerial image of an area of the mask; wherein the aerial image represents an expected image to be formed on a photoresist of an object during a lithography process that involves illuminating the area of the mask, by a lithography tool; wherein the photoresist has a printability threshold; wherein the lithography process exhibits a process window that introduces allowable changes at pixels of the expected image that do not exceed an intensity threshold; and searching for at least one weak point at the area of the mask, which is either a local extremum point of the aerial image spaced apart from the printability threshold by a distance that does not exceed the intensity threshold or a crossing point of the printability threshold and being of a slope that is below a predefined threshold.
Public/Granted literature
- US20140270468A1 DETECTION OF WEAK POINTS OF A MASK Public/Granted day:2014-09-18
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