发明授权
- 专利标题： Semiconductor device with non-linear surface
- 专利标题（中）： 具有非线性表面的半导体器件
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申请号： US14046985申请日： 2013-10-06
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公开(公告)号： US09299784B2公开(公告)日： 2016-03-29
- 发明人: Xiaomeng Chen , Zhiqiang Wu , Shih-Chang Liu , Chien-Hong Chen
- 申请人： Taiwan Semiconductor Manufacturing Company Limited
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人： Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Cooper Legal Group, LLC
- 主分类号： H01L29/10
- IPC分类号： H01L29/10 ; H01L29/66 ; H01L29/78 ; H01L29/423 ; H01L29/786 ; H01L29/04
摘要：
A semiconductor device includes a first channel having a first linear surface and a first non-linear surface. The semiconductor device includes a first dielectric region surrounding the first channel. The semiconductor device includes a second channel having a third linear surface and a third non-linear surface. The semiconductor device includes a second dielectric region surrounding the second channel. The semiconductor device includes a gate electrode surrounding the first dielectric region and the second dielectric region.
公开/授权文献
- US20150097218A1 SEMICONDUCTOR DEVICE WITH NON-LINEAR SURFACE 公开/授权日：2015-04-09
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