发明授权
US09301382B2 Apparatus for and method of source material delivery in a laser produced plasma EUV light source
有权
用于激光产生等离子体EUV光源的源材料输送装置和方法
- 专利标题: Apparatus for and method of source material delivery in a laser produced plasma EUV light source
- 专利标题(中): 用于激光产生等离子体EUV光源的源材料输送装置和方法
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申请号: US14094361申请日: 2013-12-02
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公开(公告)号: US09301382B2公开(公告)日: 2016-03-29
- 发明人: Alexander I. Ershov , David Evans , Matthew Graham
- 申请人: Cymer LLC
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Arent Fox LLP
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F7/20
摘要:
A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
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