发明授权
US09305814B2 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method
有权
检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
- 专利标题: Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method
- 专利标题(中): 检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
-
申请号: US11311549申请日: 2005-12-20
-
公开(公告)号: US09305814B2公开(公告)日: 2016-04-05
- 发明人: Masahiro Numakura
- 申请人: Masahiro Numakura
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2004-368282 20041220
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01L21/677
摘要:
A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
公开/授权文献
信息查询
IPC分类: