Invention Grant
- Patent Title: Multilayered substrate and method of manufacturing the same
- Patent Title (中): 多层基板及其制造方法
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Application No.: US14143527Application Date: 2013-12-30
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Publication No.: US09307632B2Publication Date: 2016-04-05
- Inventor: Doo Hwan Lee , Ho Shik Kang , Yee Na Shin , Yul Kyo Chung , Seung Eun Lee
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2012-0157886 20121231; KR10-2013-0137665 20131113
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K3/30 ; H05K3/46 ; H05K1/18 ; H01L23/00 ; H05K3/00

Abstract:
A multilayered substrate and a method of manufacturing the same. The multilayered substrate includes a plurality of wiring layers and reinforcing layers disposed at the outermost portions of both surfaces of the multilayered substrate, respectively, in order to decrease warpage of the multilayered substrate and has wiring patterns optimized depending on a scheme in which external electrodes are formed on an electronic component.
Public/Granted literature
- US20140182895A1 MULTILAYERED SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-07-03
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