发明授权
- 专利标题: Crystalline silicon ingot and method of fabricating the same
- 专利标题(中): 结晶硅锭及其制造方法
-
申请号: US13416765申请日: 2012-03-09
-
公开(公告)号: US09315918B2公开(公告)日: 2016-04-19
- 发明人: Sung-Lin Hsu , Cheng-Jui Yang , Pei-Kai Huang , Sheng-Hua Ni , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Ching-Shan Lin , Wen-Ching Hsu , Chung-Wen Lan
- 申请人: Sung-Lin Hsu , Cheng-Jui Yang , Pei-Kai Huang , Sheng-Hua Ni , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Ching-Shan Lin , Wen-Ching Hsu , Chung-Wen Lan
- 申请人地址: TW Hsinchu
- 专利权人: Sino-American Silicon Products Inc.
- 当前专利权人: Sino-American Silicon Products Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Osha Liang LLP
- 优先权: TW100137420A 20111014
- 主分类号: C01B33/02
- IPC分类号: C01B33/02 ; C30B9/00 ; C30B11/00 ; C30B28/06 ; C30B29/06
摘要:
A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.
公开/授权文献
信息查询