发明授权
- 专利标题： Illumination system of a microlithographic projection exposure apparatus with a birefringent element
- 专利标题（中）： 具有双折射元件的微光刻投影曝光装置的照明系统
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申请号： US12717696申请日： 2010-03-04
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公开(公告)号： US09316920B2公开(公告)日： 2016-04-19
- 发明人: Damian Fiolka , Daniel Walldorf , Ingo Saenger
- 申请人： Damian Fiolka , Daniel Walldorf , Ingo Saenger
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 优先权： DE102007043958 20070914
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03F7/20
摘要：
The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.
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