发明授权
US09329500B2 Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor
有权
所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较
- 专利标题： Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor
- 专利标题（中）： 所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较
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申请号： US12598377申请日： 2008-04-29
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公开(公告)号： US09329500B2公开(公告)日： 2016-05-03
- 发明人: Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
- 申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请： PCT/NL2008/050264 WO 20080429
- 国际公布： WO2008/136666 WO 20081113
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; G03F7/20 ; G03F9/00
摘要：
The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
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