Invention Grant
- Patent Title: Photomask error correction
- Patent Title (中): 光掩模纠错
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Application No.: US14296705Application Date: 2014-06-05
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Publication No.: US09330225B2Publication Date: 2016-05-03
- Inventor: Aditya Chaudhary , Kalpesh G. Dave , Mini M. Ghosal , Ioana Graur , Bhavani P. Kumar
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Steven J. Meyers
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Design errors generated employing a mask rule check (MRC) program are indexed and examined one by one by an automated computer program connected to a false error pattern database that contains previously known waivered patterns, a real error pattern database that contains previously known pairs of an error-containing pattern and a corresponding error-free pattern, and optionally a mask house rule database. A waiver is applied to each design error for which a matching pattern is found in the false error pattern database. Each design error for which a match is found in the real error pattern database is modified to substitute an error-free pattern for an error-containing pattern therein. The output of the automated program includes a list of design errors for which no solution is found by the automated program.
Public/Granted literature
- US20150356228A1 PHOTOMASK ERROR CORRECTION Public/Granted day:2015-12-10
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