Methods of forming a fin-shaped Field Effect Transistor (FinFET) are provided. The methods may include selectively incorporating source/drain extension-region dopants into source and drain regions of a semiconductor fin, using a mask to block incorporation of the source/drain extension-region dopants into at least portions of the semiconductor fin. The methods may include removing portions of the source and drain regions of the semiconductor fin to define recesses therein. The methods may include epitaxially growing source and drain regions from the recesses in the semiconductor fin.