Invention Grant
- Patent Title: Charged particle beam device and measuring method using the same
- Patent Title (中): 带电粒子束装置及其测量方法
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Application No.: US14244802Application Date: 2014-04-03
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Publication No.: US09336984B2Publication Date: 2016-05-10
- Inventor: Daisuke Bizen , Hajime Kawano , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2013-077335 20130403
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/28 ; H01J37/244

Abstract:
In an SEM provided with an ExB deflector for deflecting secondary electrons outside an optical axis of a primary electron beam between an electronic source and an object lens for condensing the primary electron beam and irradiating a sample with the beam, a unit to decelerate the secondary electrons deflected in the ExB deflector, and a magnetic generator for deflecting the decelerated secondary electron are provided, and a plurality of energy filters and detectors are arranged around the magnetic generator. That is, by separating loci of the secondary electrons incident on the energy filters and of the secondary electrons reflected at the energy filters by the magnetic generator, both of the secondary electrons are concurrently detected.
Public/Granted literature
- US20140299767A1 CHARGED PARTICLE BEAM DEVICE AND MEASURING METHOD USING THE SAME Public/Granted day:2014-10-09
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