Invention Grant
- Patent Title: EUV light source apparatus
- Patent Title (中): EUV光源装置
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Application No.: US14875166Application Date: 2015-10-05
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Publication No.: US09338869B2Publication Date: 2016-05-10
- Inventor: Takanobu Ishihara , Hiroshi Itafuji
- Applicant: Gigaphoton, Inc. , CKD Corporation
- Applicant Address: JP Tochigi JP Aichi
- Assignee: GIGAPHOTON INC.,CKD CORPORATION
- Current Assignee: GIGAPHOTON INC.,CKD CORPORATION
- Current Assignee Address: JP Tochigi JP Aichi
- Agency: Studebaker & Brackett PC
- Priority: JP2008-328274 20081224; JP2009-288898 20091221
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01L27/00 ; G21K5/08 ; G03F7/20

Abstract:
A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.
Public/Granted literature
- US20160029470A1 EUV LIGHT SOURCE APPARATUS Public/Granted day:2016-01-28
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