Invention Grant
- Patent Title: Methods and systems for reducing silica recession in silicon-containing materials
- Patent Title (中): 减少含硅材料二氧化硅退化的方法和系统
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Application No.: US13717773Application Date: 2012-12-18
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Publication No.: US09341412B2Publication Date: 2016-05-17
- Inventor: Krishan Lal Luthra
- Applicant: GENERAL ELECTRIC COMPANY
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent John P. Darling
- Main IPC: F01D5/28
- IPC: F01D5/28 ; F02C6/08 ; F02C7/18 ; F26B23/02 ; F23R3/00 ; C04B41/00 ; C04B41/45 ; C04B41/80

Abstract:
The present disclosure relates to methods and systems for reducing silica recession of silicon-containing ceramics or silicon-containing ceramic composites, particularly those exposed to a combustion gas or to combustion gas environments, including those exposed to high temperature combustion gas environments. The methods and systems involve silicon-doping of compressed air and/or removal of moisture from compressed air prior to co-mingling the treated compressed air with the combustion gas to which the silicon-containing ceramics or silicon-containing ceramic composites are exposed.
Public/Granted literature
- US20140165419A1 METHODS AND SYSTEMS FOR REDUCING SILICA RECESSION IN SILICON-CONTAINING MATERIALS Public/Granted day:2014-06-19
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