Invention Grant
- Patent Title: Disabling electrical connections using pass-through 3D interconnects and associated systems and methods
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Application No.: US14324958Application Date: 2014-07-07
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Publication No.: US09343368B2Publication Date: 2016-05-17
- Inventor: Jeffery W. Janzen , Michael Chaine , Kyle K. Kirby , William M. Hiatt
- Applicant: Micron Technology, Inc. , Russell D. Slifer
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/48 ; H01L21/82 ; H01L23/525 ; H01L23/60 ; H01L25/065 ; H01L25/00 ; H01L21/50 ; H01L23/52 ; H01L23/62

Abstract:
Pass-through 3D interconnects and microelectronic dies and systems of stacked dies that include such interconnects to disable electrical connections are disclosed herein. In one embodiment, a system of stacked dies includes a first microelectronic die having a backside, an interconnect extending through the first die to the backside, an integrated circuit electrically coupled to the interconnect, and a first electrostatic discharge (ESD) device electrically isolated from the interconnect. A second microelectronic die has a front side coupled to the backside of the first die, a metal contact at the front side electrically coupled to the interconnect, and a second ESD device electrically coupled to the metal contact. In another embodiment, the first die further includes a substrate carrying the integrated circuit and the first ESD device, and the interconnect is positioned in the substrate to disable an electrical connection between the first ESD device and the interconnect.
Public/Granted literature
- US20140319697A1 DISABLING ELECTRICAL CONNECTIONS USING PASS-THROUGH 3D INTERCONNECTS AND ASSOCIATED SYSTEMS AND METHODS Public/Granted day:2014-10-30
Information query
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