Invention Grant
- Patent Title: Sealing structure, device, and method for manufacturing device
- Patent Title (中): 密封结构,装置及制造方法
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Application No.: US13999502Application Date: 2014-03-05
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Publication No.: US09343706B2Publication Date: 2016-05-17
- Inventor: Minato Ito , Kohei Yokoyama , Yusuke Nishido
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., LTD.
- Current Assignee: Semiconductor Energy Laboratory Co., LTD.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2013-045722 20130307
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L51/52 ; H01L27/32

Abstract:
Provided is a device in which heat conduction from a sealant to a functional element is suppressed and whose bezel is slim. The sealing structure includes a first substrate, a second substrate whose surface over which a sealed component is provided faces the first substrate, and a frame-like sealant which seals a space between the first substrate and the second substrate with the first substrate and the second substrate. The second substrate includes a groove portion between the sealant and the sealed component. The groove portion is in a vacuum or includes a substance whose heat conductivity is lower than that of the second substrate.
Public/Granted literature
- US20140252386A1 Sealing structure, device, and method for manufacturing device Public/Granted day:2014-09-11
Information query
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