发明授权
US09349771B2 Microlens forming method and solid-state image sensor manufacturing method
有权
微透镜成型方法和固态图像传感器的制造方法
- 专利标题: Microlens forming method and solid-state image sensor manufacturing method
- 专利标题(中): 微透镜成型方法和固态图像传感器的制造方法
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申请号: US14591467申请日: 2015-01-07
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公开(公告)号: US09349771B2公开(公告)日: 2016-05-24
- 发明人: Mitsuhiro Yomori , Masaki Kurihara , Yasuhiro Sekine
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2014-012765 20140127; JP2014-234005 20141118
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; G02B3/00
摘要:
A microlens forming method, comprising etching a first member and a second member arranged on the first member, the second member including a concavo-convex shape, and forming a microlens from the first member, wherein, the etching of the first and the second members is performed under a condition that an etching rate of the first member is higher than that of the second member, a portion of the first member under the concave portion is exposed during the etching of the second member, and the exposed portion of the first member is removed in the etching of the first member.
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