Invention Grant
US09349922B2 Mask, mask group, manufacturing method of pixels and pixel structure
有权
掩模，掩模组，像素和像素结构的制造方法
- Patent Title: Mask, mask group, manufacturing method of pixels and pixel structure
- Patent Title (中): 掩模，掩模组，像素和像素结构的制造方法
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Application No.: US14646915Application Date: 2014-12-29
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Publication No.: US09349922B2Publication Date: 2016-05-24
- Inventor: Haidong Wu , Tae Gyu Kim , Qun Ma , Juanjuan Bai
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Beijing CN Ordos, Innver Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos, Innver Mongolia
- Agency: Ladas & Parry LLP
- Priority: CN201410421343 20140825
- International Application: PCT/CN2014/095285 WO 20141229
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L33/44 ; H01L33/08 ; C23C14/04
Abstract:
Embodiments of the disclosure provide a mask, a mask group, a manufacturing method of pixels and a pixel structure. The mask includes a shielding region and an opening region which are alternately arranged. A width of the opening region is twice of a width of one sub pixel, and a width of the shielding region between two adjacent opening regions is four times of the width of one sub pixel.
Public/Granted literature
- US20160056342A1 MASK, MASK GROUP, MANUFACTURING METHOD OF PIXELS AND PIXEL STRUCTURE Public/Granted day:2016-02-25
Information query
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