Invention Grant
US09352520B2 Pattern forming method, method for manufacturing color filter, and color filter manufactured thereby
有权
图案形成方法，制造滤色器的方法以及由此制造的滤色器
- Patent Title: Pattern forming method, method for manufacturing color filter, and color filter manufactured thereby
- Patent Title (中): 图案形成方法，制造滤色器的方法以及由此制造的滤色器
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Application No.: US14227342Application Date: 2014-03-27
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Publication No.: US09352520B2Publication Date: 2016-05-31
- Inventor: Mitsuji Yoshibayashi , Yasuo Sugishima
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-215626 20110929
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B29D11/00 ; G03F7/00 ; G02B5/20 ; G02B5/23 ; G02F1/1335
Abstract:
There is provided a pattern forming method, including: forming an organic film layer on a substrate; forming a patterned photoresist mask on the organic film layer; and performing a specific dry etching process to form a pattern on the organic layer.
Public/Granted literature
- US20140211334A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, AND COLOR FILTER MANUFACTURED THEREBY Public/Granted day:2014-07-31
Information query
