Invention Grant
- Patent Title: Block copolymer and pattern forming method using the same
- Patent Title (中): 嵌段共聚物和使用其的图案形成方法
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Application No.: US14466735Application Date: 2014-08-22
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Publication No.: US09354522B2Publication Date: 2016-05-31
- Inventor: Min Hyuck Kang , Tae Woo Kim , Myung Im Kim , Moon Gyu Lee , Su Mi Lee , Seung-Won Park , Lei Xie , Bong-Jin Moon , Na Na Kang
- Applicant: SAMSUNG DISPLAY CO., LTD. , SOGANG UNIVERSITY RESEARCH FOUNDATION
- Applicant Address: KR Yongin-Si, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0012192 20140203
- Main IPC: G03C1/00
- IPC: G03C1/00 ; G03F7/40 ; H01L21/308 ; C08F293/00
Abstract:
A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
Public/Granted literature
- US20150218300A1 BLOCK COPOLYMER AND PATTERN FORMING METHOD USING THE SAME Public/Granted day:2015-08-06
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