Invention Grant
- Patent Title: Imprinting stamp and nano-imprinting method using the same
- Patent Title (中): 印记邮票和使用相同的纳米印记法
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Application No.: US13617874Application Date: 2012-09-14
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Publication No.: US09360751B2Publication Date: 2016-06-07
- Inventor: Ki-yeon Yang , Woong Ko , Jae-kwan Kim , Du-hyun Lee , Byung-kyu Lee
- Applicant: Ki-yeon Yang , Woong Ko , Jae-kwan Kim , Du-hyun Lee , Byung-kyu Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce
- Priority: KR10-2011-0134002 20111213
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C59/02 ; B82Y10/00 ; B82Y40/00

Abstract:
An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.
Public/Granted literature
- US20130147096A1 Imprinting Stamp And Nano-Imprinting Method Using The Same Public/Granted day:2013-06-13
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