Invention Grant
- Patent Title: Charged particle beam apparatus and sample observation method
- Patent Title (中): 带电粒子束装置和样品观察方法
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Application No.: US14420942Application Date: 2013-07-08
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Publication No.: US09362083B2Publication Date: 2016-06-07
- Inventor: Yusuke Ominami , Shinsuke Kawanishi , Hiroyuki Suzuki , Kohtaro Hosoya , Masanari Furiki
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2012-202194 20120914
- International Application: PCT/JP2013/068587 WO 20130708
- International Announcement: WO2014/041882 WO 20140320
- Main IPC: H01J37/18
- IPC: H01J37/18 ; H01J37/26 ; H01J37/16 ; H01J37/28 ; H01J37/20

Abstract:
There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part (300) that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (6), the structure being arranged so that the sample (6) is irradiated with a primary charged particle beam while the sample (6) and the diaphragm (10) are kept out of contact with each other.
Public/Granted literature
- US20150221470A1 Charged Particle Beam Apparatus and Sample Observation Method Public/Granted day:2015-08-06
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