Invention Grant
- Patent Title: Semiconductor device and imaging apparatus
- Patent Title (中): 半导体装置及成像装置
-
Application No.: US13793445Application Date: 2013-03-11
-
Publication No.: US09362328B2Publication Date: 2016-06-07
- Inventor: Takaaki Negoro , Hirofumi Watanabe , Yutaka Hayashi , Toshitaka Ota , Yasushi Nagamune
- Applicant: Takaaki Negoro , Hirofumi Watanabe , Yutaka Hayashi , Toshitaka Ota , Yasushi Nagamune
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology,RICOH COMPANY, LTD.
- Current Assignee: National Institute of Advanced Industrial Science and Technology,RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2012-054240 20120312
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L29/73 ; H01L31/11 ; H01L29/739

Abstract:
The invention relates to a semiconductor device having a vertical transistor bipolar structure of emitter, base, and collector formed in this order from a semiconductor substrate surface in a depth direction. The semiconductor device includes an electrode embedded from the semiconductor substrate surface into the inside and insulated by an oxide film. In the surface of the substrate, a first-conductivity-type first semiconductor region, a second-conductivity-type second semiconductor region, and a first-conductivity-type third semiconductor region are arranged, from the surface side, inside a semiconductor device region surrounded by the electrode and along the electrode with the oxide film interposed therebetween, the second semiconductor region located below the first semiconductor region, the third semiconductor region located below the second semiconductor region. The electrode is insulated from the first to third semiconductor regions, and current gain is variable through application of voltage to the electrode.
Public/Granted literature
- US20130234277A1 SEMICONDUCTOR DEVICE AND IMAGING APPARATUS Public/Granted day:2013-09-12
Information query
IPC分类: