Invention Grant
- Patent Title: Confined resistance variable memory cells and methods
- Patent Title (中): 密闭电阻变量记忆单元及方法
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Application No.: US14083069Application Date: 2013-11-18
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Publication No.: US09362495B2Publication Date: 2016-06-07
- Inventor: Zailong Bian
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L47/00 ; H01L45/00 ; H01C1/02 ; H01C7/13 ; H01C17/06

Abstract:
Methods, devices, and systems associated with resistance variable memory device structures can include a method of forming a confined resistance variable memory cell structure includes forming a resistance variable material such that a first unmodified portion of the resistance variable material contacts a bottom electrode and a second unmodified portion of the resistance variable material contacts a top electrode.
Public/Granted literature
- US20140151629A1 CONFINED RESISTANCE VARIABLE MEMORY CELLS AND METHODS Public/Granted day:2014-06-05
Information query
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