Invention Grant
US09371460B2 Photopolymerization method, ink set, ink composition, and water-soluble biimidazole
有权
光聚合方法,油墨组合,油墨组合物和水溶性双咪唑
- Patent Title: Photopolymerization method, ink set, ink composition, and water-soluble biimidazole
- Patent Title (中): 光聚合方法,油墨组合,油墨组合物和水溶性双咪唑
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Application No.: US14611694Application Date: 2015-02-02
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Publication No.: US09371460B2Publication Date: 2016-06-21
- Inventor: Katsuyuki Yofu
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2012-207631 20120920; JP2013-061109 20130322
- Main IPC: C08F2/46
- IPC: C08F2/46 ; B29C71/04 ; C08G61/04 ; C09D11/30 ; C07D233/88 ; C08F2/50 ; B41M7/00 ; C09D11/101 ; C09D11/40 ; C07D233/58 ; C07D233/64 ; C09D133/08 ; C09D133/26

Abstract:
A photopolymerization method in which an ink composition including (A) a polymerizing compound having an ethylenic unsaturated group, (B) a photopolymerization initiator represented by Formula (1) described below, and (C) a hydrogen donor having a structure in which a nitrogen atom is directly bonded to an aromatic ring, in which the aromatic ring has an electron-withdrawing group or the nitrogen atom constitutes a hetero ring, is photopolymerized under acidic conditions, in Formula (1), each of R1 to R30 represents a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group.
Public/Granted literature
- US20150148442A1 PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE Public/Granted day:2015-05-28
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