发明授权
- 专利标题： Polymer pen lithography
- 专利标题（中）： 聚合物笔光刻
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申请号： US12989279申请日： 2009-04-25
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公开(公告)号： US09372397B2公开(公告)日： 2016-06-21
- 发明人: Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
- 申请人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
- 申请人地址： US IL Evanston
- 专利权人： NORTHWESTERN UNIVERSITY
- 当前专利权人： NORTHWESTERN UNIVERSITY
- 当前专利权人地址： US IL Evanston
- 代理机构： Marshall, Gerstein & Borun LLP
- 国际申请： PCT/US2009/041738 WO 20090425
- 国际公布： WO2009/132321 WO 20091029
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; B82Y10/00 ; B82Y40/00
摘要：
The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.
公开/授权文献
- US20110132220A1 POLYMER PEN LITHOGRAPHY 公开/授权日：2011-06-09
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