- 专利标题： Methods for stripping photoresist and/or cleaning metal regions
-
申请号： US13759958申请日： 2013-02-05
-
公开(公告)号： US09373497B2公开(公告)日： 2016-06-21
- 发明人: David Chen , Haruhiro Harry Goto , Martina Su , Frank Greer , Shamsuddin Alokozai
- 申请人： Novellus Systems, Inc.
- 申请人地址： US CA Fremont
- 专利权人： Novellus Systems, Inc.
- 当前专利权人： Novellus Systems, Inc.
- 当前专利权人地址： US CA Fremont
- 代理机构： Weaver Austin Villeneuve & Sampson LLP
- 主分类号： C03C15/00
- IPC分类号： C03C15/00 ; H01L21/67 ; H01L21/02 ; H01L21/311
摘要：
Methods are provided for cleaning metal regions overlying semiconductor substrates. A method for removing material from a metal region comprises heating the metal region, forming a plasma from a gas comprising hydrogen and carbon dioxide, and exposing the metal region to the plasma.
公开/授权文献
信息查询
