Invention Grant
- Patent Title: Plasma light source apparatus and plasma light generating method
- Patent Title (中): 等离子体光源装置和等离子体光产生方法
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Application No.: US14560732Application Date: 2014-12-04
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Publication No.: US09374883B2Publication Date: 2016-06-21
- Inventor: Young-Kyu Park , Wook-Rae Kim , Byeong-Hwan Jeon , Hashimoto Kohei
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2013-0150495 20131205
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.
Public/Granted literature
- US20150163893A1 PLASMA LIGHT SOURCE APPARATUS AND PLASMA LIGHT GENERATING METHOD Public/Granted day:2015-06-11
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