Invention Grant
- Patent Title: Self-forming diffraction gratings
- Patent Title (中): 自成像衍射光栅
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Application No.: US13918711Application Date: 2013-06-14
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Publication No.: US09377567B1Publication Date: 2016-06-28
- Inventor: Alan J. Jacobsen , Oleg M. Efimov , William Carter , Sophia S. Yang
- Applicant: HRL LABORATORIES, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Lewis Roca Rothgerber Christie LLP
- Main IPC: G02B5/18
- IPC: G02B5/18
Abstract:
A diffraction grating and a method for fabricating the diffraction grating. In one embodiment, a layer of photo-monomer is applied to a substrate and the photomonomer is exposed to a collimated beam of light to form the diffraction grating. The intensity of the collimated beam of light incident on the layer of photo-monomer may have substantially no spatial variation across the first collimated beam of light.
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