Invention Grant
- Patent Title: Determining position and curvature information directly from a surface of a patterning device
- Patent Title (中): 从图案形成装置的表面直接确定位置和曲率信息
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Application No.: US14357514Application Date: 2013-05-31
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Publication No.: US09377700B2Publication Date: 2016-06-28
- Inventor: Mark Josef Schuster , Santiago E. Del Puerto , Daniel Nathan Burbank , Duncan Walter Bromley , Franciscus Godefridus Casper Bijnen
- Applicant: ASML Holding N.V. , ASML Netherlands B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- Current Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/061240 WO 20130531
- International Announcement: WO2013/178775 WO 20131205
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/62 ; G03F7/20 ; G03F1/00 ; G03F1/38

Abstract:
Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.
Public/Granted literature
- US20140307246A1 DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE Public/Granted day:2014-10-16
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