Invention Grant
- Patent Title: Method and system for applying materials on a substrate
- Patent Title (中): 在衬底上施加材料的方法和系统
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Application No.: US13131392Application Date: 2009-11-30
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Publication No.: US09381759B2Publication Date: 2016-07-05
- Inventor: Michael Dovrat , Ran Asher Peleg , Amir Hadar , Hanan Gothait
- Applicant: Michael Dovrat , Ran Asher Peleg , Amir Hadar , Hanan Gothait
- Applicant Address: IL Rehovot
- Assignee: XJET LTD
- Current Assignee: XJET LTD
- Current Assignee Address: IL Rehovot
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/IL2009/001125 WO 20091130
- International Announcement: WO2010/061394 WO 20100603
- Main IPC: B41J25/00
- IPC: B41J25/00 ; B41J3/54 ; H05K3/12

Abstract:
Embodiments of the invention are directed to a method of printing lines. A method may include positioning a plurality of print units according to a predefined spacing parameter. A method may include depositing material on a substrate by a plurality of print units to form a respective plurality of parallel lines according to a predefined spacing parameter. A printing unit may be positioned at an angle with respect to a predefined scan direction such that a predefined width of a printed line is achieved. A substrate may be rotated between scans such that a plurality of lines in a respective plurality of directions is printed in a scan direction.
Public/Granted literature
- US20110279544A1 METHOD AND SYSTEM FOR APPLYING MATERIALS ON A SUBSTRATE Public/Granted day:2011-11-17
Information query
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