Invention Grant
- Patent Title: Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films
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Application No.: US14876057Application Date: 2015-10-06
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Publication No.: US09382270B2Publication Date: 2016-07-05
- Inventor: Mark Saly , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F7/00
- IPC: C07F7/00 ; C07F7/10 ; H01L21/02 ; C23C16/455

Abstract:
Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.
Public/Granted literature
- US20160031916A1 Substituted Silacyclopropane Precursors And Their Use For The Deposition Of Silicon-Containing Films Public/Granted day:2016-02-04
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