发明授权
- 专利标题: Cold plasma treatment devices and associated methods
- 专利标题(中): 冷等离子体处理装置及相关方法
-
申请号: US13620092申请日: 2012-09-14
-
公开(公告)号: US09384947B2公开(公告)日: 2016-07-05
- 发明人: Gregory A. Watson , Robert M. Hummel , Marc C. Jacofsky , David J. Jacofsky
- 申请人: Gregory A. Watson , Robert M. Hummel , Marc C. Jacofsky , David J. Jacofsky
- 申请人地址: US AZ Scottsdale
- 专利权人: Plasmology4, Inc.
- 当前专利权人: Plasmology4, Inc.
- 当前专利权人地址: US AZ Scottsdale
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: H01J7/24
- IPC分类号: H01J7/24 ; H01J37/32 ; A61M16/06 ; A61M16/12 ; A61M15/02 ; A61N1/44 ; H05H1/24 ; A61N1/40 ; A61L2/00 ; H05H1/46 ; A61L2/14
摘要:
A cold plasma mask application device for delivery of a cold plasma to the face of a patient. An appropriate gas is introduced into a gas containment area that is energized by one or more electrodes that receive energy from a pulsed source. The plasma can be prevented from contact with the patient's face, or can be allowed to make contact with the patient's face at the appropriate treatment area. A three-layer approach to the manufacture of the cold plasma mask application device is also described. Such a device and method can be used to treat acne as well as complex facial wounds such as those resulting from trauma, melanoma, and other cancers of the face, rosacea, and psoriasis.
公开/授权文献
- US20130072858A1 Cold Plasma Treatment Devices and Associated Methods 公开/授权日:2013-03-21
信息查询