A memory cell of a resistive random access memory and a manufacturing method thereof are provided. The method includes the following steps. A first electrode is formed. A metal oxide layer is formed on the first electrode. An electrode buffer stacked layer is formed on the metal oxide layer and includes a first buffer layer and a second buffer layer, and the first buffer layer is located between the second buffer layer and the metal oxide layer. The second buffer layer reacts with oxygen from the first buffer layer more strongly than the first buffer layer reacts with oxygen from the metal oxide layer. A second electrode layer is formed on the electrode buffer stacked layer.