Invention Grant
- Patent Title: Photoresist resin composition and method of forming patterns by using the same
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Application No.: US14677823Application Date: 2015-04-02
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Publication No.: US09389515B2Publication Date: 2016-07-12
- Inventor: Jeong Won Kim , Jin Ho Ju , Jong Kwang Lee , Min Kang , Tae Gyun Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2011-0025286 20110322
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/40 ; G03F7/022 ; G03F7/023 ; G02F1/1343 ; G03F7/30
Abstract:
A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
Public/Granted literature
- US20150212422A1 PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME Public/Granted day:2015-07-30
Information query
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