Invention Grant
- Patent Title: Semiconductor heterojunction device
- Patent Title (中): 半导体异质结装置
-
Application No.: US14723247Application Date: 2015-05-27
-
Publication No.: US09391187B2Publication Date: 2016-07-12
- Inventor: Godefridus Adrianus Maria Hurkx , Jeroen Antoon Croon , Johannes Josephus Theodorus Marinus Donkers , Stephan Bastiaan Simon Heil , Jan Sonsky
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP14171421 20140605
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/36 ; H01L29/778 ; H01L29/205 ; H01L29/32 ; H01L29/417 ; H01L29/66 ; H01L29/872 ; H01L29/06 ; H01L29/08 ; H01L29/207

Abstract:
In an example embodiment, a heterojunction device comprises a substrate, a multilayer structure disposed on the substrate. The multilayer structure has a first layer having a first semiconductor disposed on top of the substrate; a second layer has a second semiconductor is disposed on top of the first layer defining an interface between them. The second semiconductor differs from the first semiconductor such that a 2D Electron Gas forms adjacent to the interface. A first terminal couples to a first area of the interface between the first and second layers and a second terminal couples to a second area of the interface between the first and second layers; an electrically conducting channel comprises a metal or a region of the first layer with a higher defect density than another region of the first layer. The channel connects the second terminal and a region of the first layer such that electric charge can flow between them.
Public/Granted literature
- US20150357456A1 SEMICONDUCTOR HETEROJUNCTION DEVICE Public/Granted day:2015-12-10
Information query
IPC分类: