Invention Grant
US09397128B2 Process for forming a stack of different materials, and device comprising this stack
有权
用于形成不同材料的堆叠的方法,以及包括该堆叠的装置
- Patent Title: Process for forming a stack of different materials, and device comprising this stack
- Patent Title (中): 用于形成不同材料的堆叠的方法,以及包括该堆叠的装置
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Application No.: US14503460Application Date: 2014-10-01
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Publication No.: US09397128B2Publication Date: 2016-07-19
- Inventor: Patrick Gros D'aillon , Michel Marty
- Applicant: STMicroelectronics SA , Commissariat A L'Energie Atomique et aux Energies Alternatives
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics SA
- Current Assignee: STMicroelectronics SA
- Current Assignee Address: FR Montrouge
- Agency: Gardere Wynne Sewell LLP
- Priority: FR1359540 20131002
- Main IPC: H01L27/146
- IPC: H01L27/146 ; G02B5/20 ; G02B5/28 ; H04N9/04

Abstract:
A stack of layers defines a filter and is formed by copper on hydrogenated silicon nitride supported by a carrier. The filter includes a layer of hydrogenated silicon nitride, a layer of silicon oxide on the layer of hydrogenated silicon nitride and a layer of copper on the layer of silicon oxide. The layer of hydrogenated silicon nitride may have, in a vicinity of its upper side, a ratio of a number of silicon atoms per cubic centimeter to a number of nitrogen atoms per cubic centimeter lower than 0.8 (or even lower than 0.6), with a number of silicon-hydrogen bonds smaller than or equal to 6×1021 bonds per cubic centimeter (or even smaller than 0.5×1021 bonds per cubic centimeter). The filter further includes an additional layer of copper between the layer of hydrogenated silicon nitride and the carrier.
Public/Granted literature
- US20150091116A1 PROCESS FOR FORMING A STACK OF DIFFERENT MATERIALS, AND DEVICE COMPRISING THIS STACK Public/Granted day:2015-04-02
Information query
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