发明授权
- 专利标题： Apparatus and method for cleaning photomask
- 专利标题（中）： 用于清洁光掩模的设备和方法
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申请号： US14255557申请日： 2014-04-17
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公开(公告)号： US09400425B2公开(公告)日： 2016-07-26
- 发明人: Sung Ho Kwak , Min Young Cho
- 申请人： AP Systems Inc.
- 申请人地址： KR Hwaseong, Gyeonggi-Do
- 专利权人： AP Systems Inc.
- 当前专利权人： AP Systems Inc.
- 当前专利权人地址： KR Hwaseong, Gyeonggi-Do
- 代理机构： Locke Lord LLP
- 代理商 Christopher J. Capelli; Daniel J. Fiorello
- 优先权： KR10-2013-0059717 20130527
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; G03F1/82
摘要：
This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.
公开/授权文献
- US20140345646A1 APPARATUS AND METHOD FOR CLEANING PHOTOMASK 公开/授权日：2014-11-27
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