Invention Grant
- Patent Title: Organometallic compound preparation
- Patent Title (中): 有机金属化合物制剂
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Application No.: US14642704Application Date: 2015-03-09
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Publication No.: US09403145B2Publication Date: 2016-08-02
- Inventor: Ravindra S. Dixit , Hua Bai , Curtis D. Modtland , Robert A. Ware , John G. Pendergast, Jr. , Christopher P. Christenson , Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Kenneth M. Crouch , Robert F. Polcari
- Applicant: Dow Global Technologies LLC , Rohm and Haas Electronic Materials LLC
- Applicant Address: US MI Midland US MA Marlborough
- Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MI Midland US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: B01J19/24
- IPC: B01J19/24 ; C07F7/00 ; C07F5/00 ; C07B61/00
Abstract:
An apparatus for continuously manufacturing organometallic compounds is provided where the apparatus has a source of a first reactant stream wherein the first reactant comprises a metal; a source of a second reactant stream; a laminar flow contacting zone for cocurrently contacting the first reactant stream and the second reactant stream; a mixing zone comprising a turbulence-promoting device; and a heat transfer zone.
Public/Granted literature
- US20150174552A1 ORGANOMETALLIC COMPOUND PREPARATION Public/Granted day:2015-06-25
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