Invention Grant
US09406537B2 Cover opening/closing apparatus, thermal processing apparatus using the same, and cover opening/closing method
有权
盖打开/关闭装置,使用其的热处理装置和盖打开/关闭方法
- Patent Title: Cover opening/closing apparatus, thermal processing apparatus using the same, and cover opening/closing method
- Patent Title (中): 盖打开/关闭装置,使用其的热处理装置和盖打开/关闭方法
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Application No.: US14017654Application Date: 2013-09-04
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Publication No.: US09406537B2Publication Date: 2016-08-02
- Inventor: Katsuhiko Oyama , Yasushi Takeuchi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2012-196197 20120906
- Main IPC: H01L21/673
- IPC: H01L21/673 ; H01L21/677

Abstract:
Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit.
Public/Granted literature
Information query
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