Invention Grant
US09416003B2 Semiconductor die with high pressure cavity 有权
半导体模具采用高压腔

Semiconductor die with high pressure cavity
Abstract:
A semiconductor die includes a device structure having a micro-electronic device located at a surface of a substrate and a cap coupled to the device structure with the micro-electronic device positioned in a cavity located between the cap and the substrate. A sacrificial material is provided within the cavity, coupling the cap to the device structure. The sacrificial material is heated in the cavity to cause the sacrificial material to decompose to a gaseous species. The presence of the gaseous species in the cavity increases a pressure level in the cavity from an initial pressure to a final pressure.
Public/Granted literature
Information query
Patent Agency Ranking
0/0