Invention Grant
- Patent Title: Semiconductor die with high pressure cavity
- Patent Title (中): 半导体模具采用高压腔
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Application No.: US14188649Application Date: 2014-02-24
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Publication No.: US09416003B2Publication Date: 2016-08-16
- Inventor: Matthieu Lagouge
- Applicant: Matthieu Lagouge
- Applicant Address: US TX Austin
- Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee Address: US TX Austin
- Agent Charles E. Bergere
- Main IPC: B81B7/02
- IPC: B81B7/02 ; B81C1/00 ; H01L21/447

Abstract:
A semiconductor die includes a device structure having a micro-electronic device located at a surface of a substrate and a cap coupled to the device structure with the micro-electronic device positioned in a cavity located between the cap and the substrate. A sacrificial material is provided within the cavity, coupling the cap to the device structure. The sacrificial material is heated in the cavity to cause the sacrificial material to decompose to a gaseous species. The presence of the gaseous species in the cavity increases a pressure level in the cavity from an initial pressure to a final pressure.
Public/Granted literature
- US20150239733A1 SEMICONDUCTOR DIE WITH HIGH PRESSURE CAVITY Public/Granted day:2015-08-27
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