发明授权
- 专利标题: Methods of affecting material properties and applications therefor
- 专利标题(中): 影响材料性能及其应用的方法
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申请号: US13470731申请日: 2012-05-14
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公开(公告)号: US09425027B2公开(公告)日: 2016-08-23
- 发明人: Ludovic Godet , Christopher Hatem , Deepak Ramappa , Xianfeng Lu , Anthony Renau , Patrick Martin
- 申请人: Ludovic Godet , Christopher Hatem , Deepak Ramappa , Xianfeng Lu , Anthony Renau , Patrick Martin
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 代理机构: Nields, Lemack & Frame, LLC
- 主分类号: C23C14/48
- IPC分类号: C23C14/48 ; C23C14/34 ; H01J37/32 ; B41J2/16
摘要:
Methods of affecting a material's properties through the implantation of ions, such as by using a plasma processing apparatus with a plasma sheath modifier. In this way, properties such as resistance to chemicals, adhesiveness, hydrophobicity, and hydrophilicity, may be affected. These methods can be applied to a variety of technologies. In some cases, ion implantation is used in the manufacture of printer heads to reduce clogging by increasing the materials hydrophobicity. In other embodiments, MEMS and NEMS devices are produced using ion implantation to change the properties of fluid channels and other structures. In addition, ion implantation can be used to affect a material's resistance to chemicals, such as acids.
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