Invention Grant
- Patent Title: Heater block and a substrate treatment apparatus
- Patent Title (中): 加热器块和基板处理装置
-
Application No.: US13895331Application Date: 2013-05-15
-
Publication No.: US09431279B2Publication Date: 2016-08-30
- Inventor: Chang-Kyo Kim , Sung-Chul Kim , Chang-Min Kwon , Ki-Nam Kim
- Applicant: AP SYSTEMS INC.
- Applicant Address: KR
- Assignee: AP SYSTEMS INC.
- Current Assignee: AP SYSTEMS INC.
- Current Assignee Address: KR
- Priority: KR10-2012-0052971 20120518
- Main IPC: F27B5/14
- IPC: F27B5/14 ; H01L21/67
Abstract:
The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.
Public/Granted literature
- US20130308928A1 HEATER BLOCK AND A SUBSTRATE TREATMENT APPARATUS Public/Granted day:2013-11-21
Information query
