Invention Grant
- Patent Title: Methods of manufacturing a phase change memory device including a heat sink
- Patent Title (中): 制造包括散热器的相变存储器件的方法
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Application No.: US14868350Application Date: 2015-09-28
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Publication No.: US09431610B2Publication Date: 2016-08-30
- Inventor: Tae-Jin Park , Yoon-Jong Song , Chil-Hee Chung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2012-0059323 20120601
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A phase change memory device includes a phase change memory unit and a heat sink. The phase change memory unit includes a phase change material layer pattern, a lower electrode beneath the phase change material layer pattern configured to heat the phase change material layer pattern, and an upper electrode on the phase change material layer pattern. The heat sink configured to absorb heat from the phase change memory unit. The heat sink has a top surface lower than a top surface of the upper electrode and is spaced apart from the phase change memory unit.
Public/Granted literature
- US20160020393A1 PHASE CHANGE MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2016-01-21
Information query
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