Invention Grant
- Patent Title: Determining a state of a high aspect ratio hole using measurement results from an electrostatic measurement device
- Patent Title (中): 使用来自静电测量装置的测量结果确定高纵横比孔的状态
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Application No.: US14719193Application Date: 2015-05-21
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Publication No.: US09448253B2Publication Date: 2016-09-20
- Inventor: Konstantin Chirko , Alon Litman
- Applicant: Applied Materials Israel, Ltd.
- Applicant Address: IL Rehovot
- Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01J37/00
- IPC: H01J37/00 ; G01Q60/30 ; G01Q30/02 ; H01J37/28

Abstract:
A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
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