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US09448472B2 Optical pattern transfer mask and method of fabricating the same 有权
光学图案转印掩模及其制造方法

Optical pattern transfer mask and method of fabricating the same
Abstract:
An optical pattern transfer mask includes a light transmissive substrate, a reflection layer pattern on a plurality of first regions of the light transmissive substrate, a light absorbing layer on the light transmissive substrate and the reflection layer pattern, and a bank layer pattern on the light absorbing layer corresponding to the plurality of first regions of the light transmissive substrate, the bank layer pattern being vertically aligned with the reflection layer pattern. The bank layer pattern includes a Diels-Alder polymer that is polymerizable and depolymerizable by a reversible Diels-Alder reaction.
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