Invention Grant
- Patent Title: Optical pattern transfer mask and method of fabricating the same
- Patent Title (中): 光学图案转印掩模及其制造方法
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Application No.: US14640512Application Date: 2015-03-06
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Publication No.: US09448472B2Publication Date: 2016-09-20
- Inventor: Younggil Kwon
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2014-0125248 20140919
- Main IPC: B41M5/40
- IPC: B41M5/40 ; G03F1/38 ; G03F1/00 ; B41M5/44 ; H01L51/00

Abstract:
An optical pattern transfer mask includes a light transmissive substrate, a reflection layer pattern on a plurality of first regions of the light transmissive substrate, a light absorbing layer on the light transmissive substrate and the reflection layer pattern, and a bank layer pattern on the light absorbing layer corresponding to the plurality of first regions of the light transmissive substrate, the bank layer pattern being vertically aligned with the reflection layer pattern. The bank layer pattern includes a Diels-Alder polymer that is polymerizable and depolymerizable by a reversible Diels-Alder reaction.
Public/Granted literature
- US20160085146A1 OPTICAL PATTERN TRANSFER MASK AND METHOD OF FABRICATING THE SAME Public/Granted day:2016-03-24
Information query
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