Invention Grant
- Patent Title: Making multi-layer micro-wire structure
- Patent Title (中): 制作多层微线结构
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Application No.: US14217539Application Date: 2014-03-18
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Publication No.: US09448674B2Publication Date: 2016-09-20
- Inventor: Ronald Steven Cok
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Raymond L. Owens; Kevin E. Spaulding
- Main IPC: G06F3/044
- IPC: G06F3/044 ; H05K3/46 ; G01R27/26

Abstract:
A method of making a multi-layer micro-wire structure includes providing a substrate with a micro-wire layer having first and second areas. The micro-wire layer includes first and second micro-wire electrodes and first and second connection pads in the first and second areas, respectively. Each micro-wire electrode includes one or more electrically connected micro-wires and is electrically connected to a connection pad. The micro-wires are located in a common step. The first area is separated from the second area and the first area of the substrate and the second area of the micro-wire layer are located between the first micro-wires and the second area of the substrate so that a second layer edge extends at least partly beyond a first layer edge and one or more of the second connection pads is located between at least a portion of the first layer edge and the second layer edge.
Public/Granted literature
- US20150271930A1 MAKING MULTI-LAYER MICRO-WIRE STRUCTURE Public/Granted day:2015-09-24
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