Invention Grant
- Patent Title: Thin film deposition apparatus
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Application No.: US14642360Application Date: 2015-03-09
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Publication No.: US09453282B2Publication Date: 2016-09-27
- Inventor: Jong-Won Hong , Seok-Rak Chang , Chang-Mog Jo , Young-Mook Choi , Jae-Kwang Ryu
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2010-0021835 20100311
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C14/04 ; C23C14/24 ; C23C14/54 ; C23C14/56 ; C23C16/04 ; H01L51/52 ; H01L51/56

Abstract:
A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.
Public/Granted literature
- US20150176131A1 THIN FILM DEPOSITION APPARATUS Public/Granted day:2015-06-25
Information query
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