Invention Grant
US09454072B2 Method and system for providing a target design displaying high sensitivity to scanner focus change
有权
用于提供对扫描仪焦点变化显示高灵敏度的目标设计的方法和系统
- Patent Title: Method and system for providing a target design displaying high sensitivity to scanner focus change
- Patent Title (中): 用于提供对扫描仪焦点变化显示高灵敏度的目标设计的方法和系统
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Application No.: US14074412Application Date: 2013-11-07
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Publication No.: US09454072B2Publication Date: 2016-09-27
- Inventor: Vladimir Levinski , Yoel Feler , Daniel Kandel
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/38 ; G01B11/14 ; G03F7/20 ; G03F1/70
Abstract:
A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.
Public/Granted literature
- US20140141536A1 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change Public/Granted day:2014-05-22
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