Invention Grant
US09455232B2 Semiconductor structure including a die seal leakage detection material, method for the formation thereof and method including a test of a semiconductor structure 有权
半导体结构,包括管芯密封泄漏检测材料,其形成方法和包括半导体结构试验的方法

Semiconductor structure including a die seal leakage detection material, method for the formation thereof and method including a test of a semiconductor structure
Abstract:
A semiconductor structure includes a semiconductor substrate, one or more interconnect layers provided over the substrate and a circuit. The circuit includes a plurality of circuit elements formed at the substrate and a plurality of electrical connections provided in the one or more interconnect layers. A die seal is provided in the one or more interconnect layers. A die seal leakage detection material is arranged in the one or more interconnect layers between the die seal and the plurality of electrical connections. The die seal provides a protection of the die seal leakage detection material from moisture if the die seal is intact. The die seal leakage detection material is adapted for providing a detectable modification of the circuit after an exposure of the die seal leakage detection material to moisture.
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